High power impulse magnetron sputtering is a new method based on DCMS. In wh ich ions are [604609]
2.1 HiPIMS
High power impulse magnetron sputtering is a new method based on DCMS. In wh ich ions are
used for thin film deposition using short pulses of high density plasma. This technique is
versatile because allows to easily control of DLC thin film structure. The HiPIMS technique
istory started from 1960s in Rusia. But the development o f this method started to claime
potential in 1990s when some scientific paper using this method were published. The most
important and cited paper of HiPIMS appear in 1999, when Vladimir Kouznetsov gave the
concept of this methods because afterwards, in the next years after many studies of different
research groups, the method star improving and became more developed [4,17]. High Power
Impulse Magnetron Sputtering operates at average power , using a low duty cycle pulse. There
is produced a high peak of power at the cathode which result a high ionized target. Consequently
the properties of created films are improved, for exemple its density, hardness, adhesion, or low
stress thin films. (anexa 1
2.1.1 HiPIMS Principle
The principle is very simple, it’s like in a normal magnetron sputtering,where we change the
power supp ly, to produce pulses with high power density (few
2kWcm ), usually formatted from
a set of capacitors charged with a constant voltage
argch edU using a DC power source, these
capacitors are sended through an inductor, directly into the plasma. We can choose different
values for our parameter like repetition frequency of the pulse, the duty cycle. These parameters
influence the power on the cathode. During the experiment , usually on an scilos cope we display
the current and the target voltage. Usually this voltage varies between 500 and 1000 V.
To calculate the energy produced per peak we have
( ) ( )dt.pulseE U t I t (0.1)
It is necessary to have a low average power density close to the target, in order to prevent the
cathode from overheating which can cause damage the cathode and also the magnets. In Fig.1. 1
is represented the setup for an High Power Impulse Magnetron Suputtering, The DC generator
produce the load of capacitor bank of pulsing unit and the energy accumulated in the capacitors
is evacuated into the plasma. This setup can vary and the HiPIMS process as well like unipolar
and bipolar.
Fig.1. 1 Basic scheme of HIPIMS power supply (figure reproduced from [4])
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